Hard chromium electroplating process

27 Mar.,2025

Uniform thickness of plated layer reduces over-thickness deposition at high current density.

 

Author: Anna

 

Process Characteristics

 

High cathodic current efficiency up to 22-26%.
 

Available current densities up to 60 amps/square decimeter or more, resulting in dramatically increased deposition rates.
 

Unlike other mixed catalyst chromium electroplating processes, RC-25 does not contain fluoride and will not leach the low current area of the workpiece.
 

Microhardness of the plated layer is 1000-1100 KHN100 Microcracks of the plated layer can be up to 1000 per inch, resulting in improved corrosion resistance.
 

Smooth, detailed and bright plating
 

Uniform thickness of plated layer reduces over-thickness deposition at high current density.
 

Does not leach lead-tin anodes, eliminating the need for special anode and cathode materials.
 

Pre-treatment process, anodes, baths, etc. are the same as traditional chrome plating process.